Collection: Ion Source

Scion Plasma’s patented SPR-100 broad beam ion source is a revolutionary plasma source that can be used to enhance magnetron sputtering, PECVD, and surface treatment. The ion source is developed based on a comprehensive plasma simulation using the company’s proprietary software ASTRA. The ion source can generate a broad single ion beam of ~80 mm diameter. The ion energy and ion current can be independently controlled from 10 to 200 eV and 20 to 1,000 mA, respectively. The ion energy distribution features a single narrow peak, which enables optimum energy transfer to the surface atoms as they are deposited. This unique characteristic allows the growth of thin films with randomly oriented and preferentially oriented polycrystalline microstructure at room temperature, which is particularly attractive for coating heat-sensitive materials. When combined with a magnetron, the ion source enables a new soft-sputtering mode that features low sputtering voltage and high current, which not only leads to ~30% increase in the deposition rates but also greatly reduces damage to delicate film surfaces. When the broad beam plasma source is used for PECVD, it results in highly efficient source gas dissociation and subsequently high deposition rates, which are highly desirable for barrier coatings and optical coatings. The broad beam plasma source is also ideal for surface treatments, which often require low ion energy and high ion flux. The ion source can operate stably over an extended period with little maintenance.