Collection: Ion Source

Scion Plasma’s patented broad beam ion source is a revolutionary plasma source that can be used to enhance magnetron sputtering, PECVD, and surface treatment. The ion source is developed based on a comprehensive plasma simulation using the company’s proprietary software ASTRA.  The ion energy distribution features a single narrow peak, which enables optimum energy transfer to the surface atoms as they are deposited.

The ion energy distribution features a single narrow peak, which enables optimum energy transfer to the surface atoms as they are deposited. This unique characteristic allows the growth of ultra-smooth thin films with randomly oriented and preferentially oriented polycrystalline microstructure at room temperature, which is particularly attractive for  coating heat-sensitive materials. When combined with a magnetron, the ion source enables  a new soft-sputtering mode that features low sputtering voltage and high current, which not only leads to ~30% increase in the deposition rates but also greatly reduces damage to delicate film surfaces. When the broad beam plasma source is used for PECVD, it results in highly efficient source gas dissociation and subsequently high deposition rates, which are highly desirable for barrier coatings and optical coatings.

The broad beam plasma source is also ideal for surface treatments, which often require low ion energy and high ion flux. The ion source can operate stably over an extended period with little maintenance. Typical applications include low-E coatings, high-rate deposition of moisture barrier coatings, optical coatings, functional coatings, hard coatings, and surface cleaning.