SPL Series Linear Ion Source

Product Overview

Scion Plasma’s patented broad-beam ion source is a next-generation plasma tool designed to enhance magnetron sputtering, PECVD, and surface treatment processes. Developed through comprehensive plasma simulations using the company’s proprietary ASTRA software, the ion source offers independent control of ion energy and ion current. Its narrow, single-peaked ion-energy distribution enables precise energy transfer to surface atoms during deposition – facilitating the growth of dense polycrystalline films at room temperature, which is ideal for coating heat-sensitive substrates. When paired with a magnetron, the ion source enables a novel soft-sputtering mode featuring low sputtering voltage and high current. This mode delivers substantially higher deposition rates while minimizing damage to delicate surfaces. In PECVD applications, the broad-beam high-density plasma promotes efficient precursor dissociation, yielding high deposition rates, dense films, and smooth surfaces that are particularly suitable for barrier and optical coatings. The broad-beam ion source is equally effective for surface-treatment applications that demand low ion energy and high ion flux. Engineered for long-term stability, the ion source delivers extended operation with minimal maintenance, making it a robust and versatile tool for advanced thin-film processing.

The SPL series broad-beam ion sources are designed for large-area coating and surface treatment applications. These sources generate a single beam of ions approximately 80 mm in width with any length over 200 mm. The ion energy is tunable from 10 to 150 eV and the ion current can be as high as 10 Amps per meter. The SPL series sources have internal and external mounting options to support a broad range of equipment geometries. 

Product Features

  • Narrow ion energy distribution
  • Independently tunable ion energy and ion current over a wide range
  • Fully compatible with magnetron sputtering. The ion source does not require a dedicated gas flow, as it operates using the process gases already present in the chamber. For specific applications, such as MetaMode deposition of oxide thin films, a dedicated gas feed to the ion source can be introduced to further enhance film oxidation.
  • Stable operation over a long period
  • Easy maintenance
  • Internal and external mounting options

Specifications

Model

SPL-Length in mm (e.g., SPL-300)

Vacuum

HV and UHV

Typical Operation Pressure

1 – 200 mTorr

Process Gases

All common gases (Ar, O2, N2, CH4, H2)

Discharge DC voltage

0 – 200 VDC

Discharge DC current

20 – 400 mA/100 mm

DC+RF Power

0 – 80 W/100 mm (DC), 10 – 40 W/100 mm (RF)

Distance from Substrate

1” – 5”

Internal Mounting

Flexible bellow with KF or CF flange connections

External Mounting

O-ring flange per customer specification

Cooling Water

0.2 – 0.4 gpm/100 W, <40 PSI

Process (Recommended)

Ion beam enhanced magnetron sputtering, PECVD, etching

Processed Materials

Metals, semiconductors, dielectrics

Warranty

1-year product warranty

 

For customers who are interested, please contact us or email us at info@scionplasma.com for a quotation. While we have standard models in stock, we can also customize the ion source length and installation configuration to match your specific equipment requirements.