SPL series ion source

Product Overview

 

Scion Plasma’s patented broad beam linear ion source is a revolutionary plasma source that can be used to enhance magnetron sputtering, PECVD, and surface treatment. The ion source is developed based on a comprehensive plasma simulation using the company’s proprietary software ASTRA. The ion source can generate a broad single ion beam of ~80 mm width and any desired length from 300 mm to 3,000 mm. The ion energy and ion current can be independently controlled from 10 to 200 eV and 20 to 400 mA/100 mm, respectively. The ion energy distribution features a single narrow peak, which enables optimum energy transfer to the surface atoms as they are deposited. This unique characteristic allows the growth of ultra-smooth thin films with randomly oriented and preferentially oriented polycrystalline microstructure at room temperature, which is particularly attractive for coating heat-sensitive materials. When combined with a magnetron, the ion source enables a new soft-sputtering mode that features low sputtering voltage and high current, which not only leads to ~30% increase in the deposition rates but also greatly reduces damage to delicate film surfaces. When the broad beam plasma source is used for PECVD, it results in highly efficient source gas dissociation and subsequently high deposition rates, which are highly desirable for barrier coatings and optical coatings. The broad beam plasma source is also ideal for surface treatments, which often require low ion energy and high ion flux. The ion source can operate stably over an extended period with little maintenance. Typical applications include low-E coatings, high-rate deposition of moisture barrier coatings, optical coatings, functional coatings, hard coatings, and surface cleaning.

 

Product Features

 

·        A broad single ion beam directed to the sample surface

·        Narrow ion energy distribution

·        Independently tunable ion energy and ion current over a wide range

·        Fully compatible with magnetron sputtering. No need to flow gas through the source – can use gases in the chamber

·        Stable operation over a long period

·        Easy maintenance

·        Scalable to any desired length for large-scale mass production  

 

Options

 

Scion Plasma offers a variety of products that can be combined with the broad beam linear ion source to achieve the best coating performance.

·        Linear sputtering magnetrons with high-target utilization rates and low discharge voltages

·        Power supplies (DC and RF)

·        Power cables

·        Scion Plasma's proprietary DC/RF combiner-filter

 

Specifications

 

Model	SPL-Length in mm (e.g., SPL-300)
Vacuum	HV and UHV
Typical Operation Pressure	1 – 2,000 mTorr
Process Gases	All common gases (Ar, O2, N2, CH4, H2)
Discharge DC voltage	0 – 200 VDC
Discharge DC current	20 – 400 mA/100 mm
DC+RF Power	0 – 80 W/100 mm (DC), 10 – 40 W/100 mm (RF)
Distance from Substrate	1” – 5”
Internal Mounting	Flexible bellow with KF or CF flange connections
External Mounting	O-ring flange per customer specification
Cooling Water	0.2 – 0.4 gpm/100 W, <40 PSI
Process (Recommended)	Ion beam enhanced magnetron sputtering, PECVD, etching
Processed Materials	Metals, semiconductors, dielectrics
Warranty	1-year product warranty

 

Dimensions

 

SEM images and optical transmittance of ultra-thin silver films deposited with and without using the broad beam ion source. The ion source treatment results in much thinner and continuous films. 

Transmittance of low-E coatings with a single silver layer deposited by magnetron sputtering with and without the ion source.