Niobium oxide (Nb2O5) thin films were
deposited under MetaMode using a new broad-beam ion source-enhanced magnetron
sputtering. The ion source significantly reduced the required oxygen
concentration from over 20 % to ~7.5 % to form fully stoichiometric Nb2O5
films. The MetaMode deposition rates were over three times higher than
conventional reactive magnetron sputtering, which requires significantly higher
oxygen concentrations. The film properties were characterized using UV-Vis
spectroscopy, atomic force microscopy (AFM), scanning electron microscope
(SEM), x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS),
four-point probe, and spectroscopic ellipsometry. The MetaMode deposited Nb2O5
thin films exhibited smoother surfaces, better optical transmittance, and
denser morphology, while overcoming the disappearing anode effect in
conventional reactive sputtering.

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