SINGLE BEAM ION SOURCES

Round Single Beam Ion Source (Model: SPR-10)

• Focused single beam of ions generated without filament
• Wide range of operation pressure (0.1 mTorr to >1 Torr)
• Widely tunable ion energies (35 eV to >300 eV)

• Beam diameter ~1” at 4" distance

• Compact design using standard feedthrough

• Easy maintenance

Linear Single Beam Ion Source (Model: SPL-75)

• Focused single beam of ions generated without filament
• Wide range of operation pressure (0.1 mTorr to >1 Torr)
• Widely tunable ion energies (35 eV to >300 eV)
• Beam width ~1” at 4" distance
• Beam length >2.0”, can be customized to any length

• Compact design using standard feedthrough/flange
• Easy maintenance

Benefits

• High-quality dense films

• Optimal ion-surface interactions for each material

• Controllable ion incident angles
• Tunable microstructure of thin films

• Compatible with common PVD and CVD depositions

• Drop-in replacement on existing systems

Example Use - Single Beam Ion Source Assisted ITO Sputtering

• Greatly increased crystallinity

• Increase film density and reduce surface roughness

• Increase deposition rate by ~35%
• Increase transmittance with a blue shift indicating improved crystallinity

• Reduce sheet resistance of ITO films over 50% with optimized ion energy

Advance Plasma Technologies

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