• Focused single beam of ions generated without filament • Wide range of operation pressure (1 mTorr to 500 mTorr) • Widely tunable ion energies (30 eV to 300 eV)
• Beam diameter ~1” at 4" distance
• Compact design using standard feedthrough/flange
• Easy maintenance
Linear Single Beam Ion Source (Model: SPL-75)
• Focused single beam of ions generated without filament • Wide range of operation pressure (1 mTorr to 500 mTorr) • Widely tunable ion energies (30 eV to 300 eV) • Beam width ~1” at 4" distance • Beam length >2.0”, can be customized to any length
• Compact design using standard feedthrough/flange • Easy maintenance
Benefits
• High-quality dense films
• Optimal ion-surface interactions for each material
• Controllable ion incident angles • Tunable microstructure of thin films
• Compatible with common PVD and CVD depositions
• Drop-in replacement on existing systems
Example Use - Single Beam Ion Source Assisted ITO Sputtering
• Greatly improved crystallinity at room temperature
• Dense ITO films with greatly reduced surface roughness
• >35% increase in deposition rate • Increased transmittance with a blue shift