Single Beam Ion Sources



Round Single Beam Ion Source (Model: SPR-10)



• Focused single beam of ions generated without filament
• Wide range of operation pressure (1 mTorr to 500 mTorr)
• Widely tunable ion energies (30 eV to 300 eV) ​

• Beam diameter ~1” at 4" distance

• Compact design using standard feedthrough/flange

• Easy maintenance



Linear Single Beam Ion Source (Model: SPL-75)



• Focused single beam of ions generated without filament
• Wide range of operation pressure (1 mTorr to 500 mTorr)
• Widely tunable ion energies (30 eV to 300 eV) ​
• Beam width ~1” at 4" distance
• Beam length >2.0”, can be customized to any length

• Compact design using standard feedthrough/flange
• Easy maintenance



Benefits



• High-quality dense films

• Optimal ion-surface interactions for each material

• Controllable ion incident angles ​
• Tunable microstructure of thin films

• Compatible with common PVD and CVD depositions

• Drop-in replacement on existing systems



Example Use - Single Beam Ion Source Assisted ITO Sputtering



• Greatly improved crystallinity at room temperature

• Dense ITO films with greatly reduced surface roughness

• >35% increase in deposition rate
• Increased transmittance with a blue shift

• ~50% reduction in sheet resistance



Advance Plasma Technologies



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